Solving the task of the data preprocessing for photomasks manufacturing using electron-beam lithography

Solving the task of the data preprocessing for photomasks manufacturing using electron-beam lithography

Korshunov A.V. (ISTC MIET, Moscow, Russia)
Ryzhova D.I. (ISTC MIET, Moscow, Russia)
Bulakh D.A. (ISTC MIET, Moscow, Russia)
Zubareva E.D. (ISTC MIET, Moscow, Russia)
Salakhov I.D. (ISTC MIET, Moscow, Russia)
Shvets I.I. (ISTC MIET, Moscow, Russia)
Klimushkin D.A. (MIET, Moscow, Russia)

Abstract

When solving the photomasks manufacturing problem using electron beam lithography, it is often insufficient to perform only the final layout check using standard EDA CAD tools. The specifics of the electronic beam control mechanisms and the physics of its interaction with matter require additional input layout control procedures to verify geometric characteristics associated with the specific application of electron beam lithography and to ensure pattern reproducibility. This paper presents the results of a software module development designed to verify layout data used as input for electron beam photomask fabrication. A list of layout requirements that must be met to solve this problem is also provided, along with examples of solutions for verifying layout compliance with these requirements.

Keywords

integrated circuit, integrated circuit layout, photomask, software, electron-beam lithography.

Edition

Proceedings of the Institute for System Programming, vol. 38, issue 2, 2026, pp. 183-194

ISSN 2220-6426 (Online), ISSN 2079-8156 (Print).

DOI: 10.15514/ISPRAS-2026-38(2)-12

For citation

Korshunov A.V., Ryzhova D.I., Bulakh D.A., Zubareva E.D., Salakhov I.D., Shvets I.I., Klimushkin D.A. Solving the task of the data preprocessing for photomasks manufacturing using electron-beam lithography. Proceedings of the Institute for System Programming, vol. 38, issue 2, 2026, pp. 183-194 DOI: 10.15514/ISPRAS-2026-38(2)-12.

Full text of the paper in pdf (in Russian) Back to the contents of the volume